CVD Equipment Corporation (NASDAQ:CVV – Get Free Report) saw a significant growth in short interest during the month of January. As of January 15th, there was short interest totaling 18,966 shares, a growth of 95.5% from the December 31st total of 9,703 shares. Based on an average trading volume of 77,656 shares, the days-to-cover ratio is currently 0.2 days. Approximately 0.4% of the company’s shares are sold short. Approximately 0.4% of the company’s shares are sold short. Based on an average trading volume of 77,656 shares, the days-to-cover ratio is currently 0.2 days.
Analyst Ratings Changes
Separately, Weiss Ratings reiterated a “sell (e+)” rating on shares of CVD Equipment in a report on Wednesday, January 21st. One investment analyst has rated the stock with a Sell rating, Based on data from MarketBeat.com, the stock has an average rating of “Sell”.
Check Out Our Latest Analysis on CVD Equipment
CVD Equipment Stock Performance
CVD Equipment (NASDAQ:CVV – Get Free Report) last announced its earnings results on Monday, November 10th. The industrial products company reported $0.06 EPS for the quarter. CVD Equipment had a negative net margin of 0.66% and a negative return on equity of 0.72%. The business had revenue of $7.41 million during the quarter.
Institutional Trading of CVD Equipment
A hedge fund recently raised its stake in CVD Equipment stock. Citadel Advisors LLC boosted its position in shares of CVD Equipment Corporation (NASDAQ:CVV – Free Report) by 93.6% during the 3rd quarter, according to the company in its most recent disclosure with the SEC. The firm owned 41,382 shares of the industrial products company’s stock after buying an additional 20,011 shares during the quarter. Citadel Advisors LLC owned approximately 0.60% of CVD Equipment worth $139,000 at the end of the most recent reporting period. 31.59% of the stock is currently owned by institutional investors.
CVD Equipment Company Profile
CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.
The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.
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